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dsa-process-controller

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Directed Self-Assembly skill for block copolymer lithography and nanoparticle templating

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How to use this skill

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Source SKILL.md: https://github.com/a5c-ai/babysitter/blob/HEAD/library/specializations/domains/science/nanotechnology/skills/dsa-process-controller/SKILL.md

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DSA Process Controller

Purpose

The DSA Process Controller skill provides directed self-assembly process control for block copolymer lithography and nanoparticle templating, enabling sub-lithographic patterning through controlled polymer phase separation.

Capabilities

  • Block copolymer selection and design
  • Annealing protocol optimization
  • Defect density analysis
  • Pattern transfer protocols
  • Graphoepitaxy and chemoepitaxy
  • Long-range order characterization

Usage Guidelines

DSA Process Control

  1. BCP Selection

    • Match pitch to target
    • Consider chi-N product
    • Select morphology (lamellar, cylindrical)

  2. Annealing Optimization

    • Choose thermal vs solvent vapor
    • Optimize temperature/time
    • Achieve equilibrium morphology

  3. Defect Analysis

    • Classify defect types
    • Quantify defect density
    • Identify root causes

Process Integration

  • Directed Self-Assembly Process Development
  • Nanolithography Process Development

Input Schema

{
  "bcp_system": "string (e.g., PS-b-PMMA)",
  "target_pitch": "number (nm)",
  "morphology": "lamellar|cylindrical|spherical",
  "guiding_type": "graphoepitaxy|chemoepitaxy",
  "substrate_pattern": "string"
}

Output Schema

{
  "annealing_protocol": {
    "method": "thermal|svA",
    "temperature": "number (C)",
    "time": "number (hours)",
    "solvent": "string (optional)"
  },
  "achieved_pitch": "number (nm)",
  "defect_density": "number (defects/um2)",
  "correlation_length": "number (nm)",
  "pattern_quality": "string"
}