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ald-process-controller

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Atomic Layer Deposition skill for conformal thin film deposition with atomic-level thickness control

QUICK START

How to use this skill

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  3. Review the proposed files and risks before you approve installation.
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I want to install this Agent Skill for this project in Codex.

Source SKILL.md: https://github.com/a5c-ai/babysitter/blob/HEAD/library/specializations/domains/science/nanotechnology/skills/ald-process-controller/SKILL.md

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ALD Process Controller

Purpose

The ALD Process Controller skill provides comprehensive atomic layer deposition process control, enabling conformal thin film growth with atomic-level precision through optimized pulse sequences and in-situ monitoring.

Capabilities

  • Precursor pulse/purge optimization
  • Growth per cycle (GPC) characterization
  • Film uniformity mapping
  • Conformality assessment
  • In-situ monitoring integration
  • Multi-component film design

Usage Guidelines

ALD Process Control

  1. Saturation Studies

    • Vary pulse times
    • Identify saturation dose
    • Optimize purge times

  2. Process Window

    • Determine ALD window
    • Optimize temperature
    • Monitor GPC stability

  3. Film Quality

    • Characterize uniformity
    • Measure conformality
    • Assess impurity levels

Process Integration

  • Thin Film Deposition Process Optimization
  • Nanodevice Integration Process Flow

Input Schema

{
  "material": "string",
  "precursor_a": "string",
  "precursor_b": "string",
  "target_thickness": "number (nm)",
  "substrate": "string",
  "temperature": "number (C)"
}

Output Schema

{
  "optimized_recipe": {
    "precursor_a_pulse": "number (s)",
    "purge_a": "number (s)",
    "precursor_b_pulse": "number (s)",
    "purge_b": "number (s)"
  },
  "gpc": "number (Angstrom/cycle)",
  "cycles_required": "number",
  "uniformity": "number (%)",
  "conformality": "number (% step coverage)"
}